﻿<?xml version='1.0' encoding='UTF-8'?><rss version="2.0" xmlns:dc="http://purl.org/dc/elements/1.1/"><channel><title>Water Environment Federation (WEF) Discussion Forums / Air Quality / Archives / Archived Forum Topics  / chlorination of raw influent / Latest Posts</title><generator>Water Environment Federation (WEF) Discussion Forums</generator><description>Water Environment Federation (WEF) Discussion Forums</description><link>http://www.wef.org/TechnicalDiscussions/</link><webMaster>jfuller@wef.org</webMaster><lastBuildDate>Wed, 19 Nov 2008 10:56:03 GMT</lastBuildDate><ttl>20</ttl><item><title>RE: chlorination of raw influent</title><link>http://www.wef.org/TechnicalDiscussions/Topic701-8-1.aspx</link><description>Consider using Magnesium Hydroxide in a master lift station before it gets to the plant.  There is a plus.  pH around 8.5 which locks in the hydrogen sulfide and great alkalinity which will improve treatment in the plant</description><pubDate>Fri, 15 Feb 2008 20:05:45 GMT</pubDate><dc:creator>01797809</dc:creator></item><item><title>RE: chlorination of raw influent</title><link>http://www.wef.org/TechnicalDiscussions/Topic701-8-1.aspx</link><description>A couple of thoughts: if you go the route of a vent and scrubber, you may need to register it as an air emissions point (especially if there is a odor treatment process involved) with your State regulators.  What (if any) monitoring would be required can vary, but will need to factor in time for paperwork, data collection, etc. Give them a call to find out what applies in your area. Second: I've seen a few wet well situations where odors were created because the ventilation system had an exhaust only (apparantly assuming that fresh air would enter from the hatchway or door), while in reality, the fan was drawing gasses from down the influent sewer. A big help was to convert to a positive pressure system, i.e., a fan blowing outside air into the wet well at a rate higher than the exhaust fan. The excess pressure keeps at least some of the odors in the sewer.</description><pubDate>Thu, 05 Jan 2006 17:32:54 GMT</pubDate><dc:creator>John Sansalone</dc:creator></item><item><title>RE: chlorination of raw influent</title><link>http://www.wef.org/TechnicalDiscussions/Topic701-8-1.aspx</link><description>Significant addition of mag hydroxide could result in production of magnesium ammonium phosphate, if you have anaerobic digesters.</description><pubDate>Thu, 05 Jan 2006 12:55:33 GMT</pubDate><dc:creator>D Shulmister</dc:creator></item><item><title>RE: chlorination of raw influent</title><link>http://www.wef.org/TechnicalDiscussions/Topic701-8-1.aspx</link><description>If you are willing to consider an alternative to chlorine, which will handle both odor and corrosion related issues, you might want to consider using Magnesium Hydroxide. It's exceptionally good at eliminating odors, and can also reduce corrosion.  It's safe and easy to handle.  We've been using it at our facility for a couple of years.  It's a really great product. &lt;/P&gt;&lt;P&gt;Mary</description><pubDate>Wed, 04 Jan 2006 16:47:20 GMT</pubDate><dc:creator>chezlab</dc:creator></item><item><title>RE: chlorination of raw influent</title><link>http://www.wef.org/TechnicalDiscussions/Topic701-8-1.aspx</link><description>may not have too much operational problem, but you would need to meet all regulatory requirements for storage.  if you really have high h2s concentration and stringent removal requirement, you may also need to use caustic.  this chemical may give you some problem.</description><pubDate>Wed, 04 Jan 2006 12:58:32 GMT</pubDate><dc:creator>WK</dc:creator></item><item><title>chlorination of raw influent</title><link>http://www.wef.org/TechnicalDiscussions/Topic701-8-1.aspx</link><description>We have a odor problem at are head works.  We have an enclosed wet well at our main pump station.  Considered using pre aeration but afraid of corrosion from the release of sulfides.  Would likely have to enclose and install some kind of ventallation or scrubber?  What are the minus and plus of using cl2?</description><pubDate>Tue, 27 Dec 2005 19:32:28 GMT</pubDate><dc:creator>J.W.Koch</dc:creator></item></channel></rss>